Vokietija – Puslaidininkiai – Cluster ALE/ICP/RIE + PECVD + ALD (HHI-07) - PR865241-3220-P
Vokietija – Puslaidininkiai – Cluster ALE/ICP/RIE + PECVD + ALD (HHI-07) - PR865241-3220-P
I dalis: Perkančioji organizacija
I.1) Pavadinimas ir adresai:
Oficialus
pavadinimas: Fraunhofer-Gesellschaft - Einkauf B12
Adresas: Hansastraße 27c
Miestas: München
Pašto
kodas: 80686
Šalis: Vokietija
Asmuo
ryšiams:
El-paštas: einkauf@zv.fraunhofer.de
Interneto adresas (-ai):
Pagrindinis adresas: https://vergabe.fraunhofer.de/
II dalis: Objektas
II.1.1) Pavadinimas:
Cluster ALE/ICP/RIE + PECVD + ALD (HHI-07) - PR865241-3220-P
Nuorodos numeris: PR865241-3220-P
II.1.2) Pagrindinis BVPŽ kodas:
31712330
Puslaidininkiai
II.1.3) Sutarties tipas:
Kita
II.1.4) Trumpas aprašymas:
The required cluster tool should include a loadlock and a handler, three separate process chambers for ALE/ICP/RIE (Atomic Layer Etching/Inductively Coupled Plasma/Reactive Ion Etching), ALD (Atomic Layer Deposition), and ICP-PECVD (Inductively Coupled Plasma-Plasma Enhanced Chemical Vapor Deposition). After etching the InP, In(Al)GaAsP, and In(Al)GaAs layers on 3" to 6" wafers in the ALE/ICP/RIE chamber, these should be transferred under high vacuum to one of the coating chambers. The ALD chamber should allow for coating with SiNx, SiO2, Al2O3, and TiO2, while the ICP-PECVD chamber should support SiNx and SiO2.
II.2) Aprašymas:
II.2.1) Kitas (-i) šio pirkimo BVPŽ kodas (-ai):
31712330 Puslaidininkiai